Perlast Helios G7HA
Perlast® Helios G7HA is a high purity perfluoroelastomer (FFKM) that offers outstanding long-term mechanical performance and excellent plasma resistance in high temperature semiconductor applications of up to 310°C.
This 70 A Shore FFKM is fully organic in formulation, offering extremely low trace metal levels for higher yields and reduced process contamination.
Perlast® Helios G7HA – the first material in the range – has undergone rigorous benchmarking tests against the leading sealing materials currently on the market in order to qualify its material characteristics.
The test results demonstrated excellent sealing performance at temperatures up to 310°C. The new elastomer grade also outperforms competitor materials against aggressive plasmas, including high concentrations of fluorine radical plasmas.
Outperforms in harsh plasma environments
Perlast® Helios G7HA has been tested extensively in a series of plasma environments (RPS NF3, RIE NF3, CCP NH3, RIE SF6, RIE O2 and CCP O2). In each environment, the new G7HA grade demonstrates a significantly lower plasma erosion rate than leading competitors – and 27% lower in NF3.
Figure 1: RIE NF3 Plasma exposure, elastomer weight loss percentage after 6 hours.
Lower trace metals than other FFKM seals
Perlast® Helios G7HA is a fully organic material grade, with analysis showing extremely low trace metal level contaminates and low particle generation when measured against comparable FFKM and FKM sealing materials. Low trace metals and low particle generation are key to reducing process contamination, significantly increasing yield and reducing operational downtime.
Perlast Helios G7HA removes trade-off between purity and performance
Previously in the semiconductor sealing market, choices had to be made between seal purity and high performance in a sealing system – and particularly so with purity versus plasma resistance. Perlast® Helios G7HA is one of the first elastomer innovations to give reliable results across both purity and resistance to aggressive plasmas and chemical media.
Developed for use in various semiconductor applications. Suitable for use in wet and dry semiconductor processes including:
- LPCVD, HDPCVD, PECVD, SACVD, ALD, PVD, MDP, EPI
Typical Seal Types
Perlast® Helios G7HA material can be moulded into dynamic and static sealing products, including isolation valves, chamber O-rings and gas inlet seals.
Limited free Perlast Helios G7HA O-ring samples are available for testing
Limited free samples of Perlast® Helios G7HA are available for testing. Simply fill out your details in the contact form below and we will be in touch within 24 hours.
The above spider diagram is a graphical overview of Perlast® Helios G7HA material performance characteristics compared with a relevant industry competitor based on a Dielectric Etch application.
Join us at this year's leading semiconductor trade shows
If you want to meet us in person and explore our high performance elastomer seals, come and join us at the leading Semiconductor tradeshows hosted around the globe.
|Event||Event Location||Event Date|
|SEMICON West 2019||Booth #1061, Moscone Center, San Francisco, United States||09/07/2019 - 11/07/2019|
|SEMICON Taiwan 2019||Booth #I2122 Hall 1F, Taipei Nangang Exhibition Center Hall 1, Taiwan||18/09/2019 - 20/09/2019|
|SEMICON Japan 2019||Tokyo Big Sight, Tokyo||11/12/2019 - 13/12/2019|
|Event Date||Event Details|
|09/07/2019 - 11/07/2019||SEMICON West 2019 Booth #1061, Moscone Center, San Francisco, United States|
|18/09/2019 - 20/09/2019||SEMICON Taiwan 2019 Booth #I2122 Hall 1F, Taipei Nangang Exhibition Center Hall 1, Taiwan|
|11/12/2019 - 13/12/2019||SEMICON Japan 2019 Tokyo Big Sight, Tokyo|
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