Perlast® Helios elastomers
Perlast® Helios G7HA is a specially developed high temperature semiconductor sealing material, which has been engineered to deliver superior plasma resistance in extreme high temperature applications.
- Fully organic, high purity perfluoroelastomer (FFKM)
- Extremely low trace metal levels
- Excellent plasma resistance
- High temperature performance up to 310°C
- Outstanding long-term mechanical performance
Perlast® Helios G7HA outperforms competitor materials against aggressive plasmas, including high concentrations of fluorine radical plasmas.
Key features
Perlast® Helios G7HA has undergone rigorous benchmarking tests against the leading sealing materials currently on the market, in order to qualify its material characteristics.
Outperforms in harsh plasma environments expand_more
Perlast® Helios G7HA has been tested extensively in a series of plasma environments (RPS NF3, RIE NF3, CCP NH3, RIE SF6, RIE O2 and CCP O2).
In each environment, the new G7HA grade demonstrates a significantly lower plasma erosion rate than leading competitors – and 27% lower in NF3.
Lower trace metals than other FFKM seals expand_more
Perlast® Helios G7HA is a fully organic material grade, with analysis showing extremely low trace metal contaminates and low particle generation when measured against comparable FFKM and FKM sealing materials.
Low trace metals and low particle generation are key to reducing process contamination, significantly increasing yield and reducing operational downtime.
Perlast® Helios G7HA removes trade-off between purity and performance expand_more
Previously in the semiconductor sealing market, choices had to be made between seal purity and high performance in a sealing system – and particularly so with purity versus plasma resistance.
Perlast® Helios G7HA is one of the first elastomer innovations to give reliable results across both purity and resistance to aggressive plasmas and chemical media.
Typical Applications expand_more
Developed for use in various semiconductor applications.
Suitable for use in wet and dry semiconductor processes including:
- Etching
- Stripping
- Cleaning
- LPCVD, HDPCVD, PECVD, SACVD, ALD, PVD, MDP, EPI
Typical Seal Types expand_more
Perlast® Helios G7HA material can be moulded into dynamic and static sealing products, including:
- Isolation valve seals
- Chamber O-rings
- Gas inlet seals
Resources
Below are some of our most popular downloads relating to Perlast® Helios.
If you require further information on any sealing topic, check out our Resources section.
- Webinar: Purity or plasma resistance – can you have both?
- Webinar: Critical sealing for high temperature semiconductor applications
- Video guide: What is ‘outgassing’, and how to prevent it?
- Benchmarking data: How does Perlast® compare to other FFKM materials?
WATCH: Introducing Perlast® Helios
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