Perlast Helios GAM6
Developed exclusively for Applied Materials for use in etch and deposition process applications. Perlast® Helios GAM6 has been designed for low erosion and ultra-low particle generation in high radical concentration plasma environments.
Perlast® Helios GAM6 is a fully organic, high purity material, offering excellent fluorine plasma resistance. It combines a fully fluorinated polymer backbone with a novel cross-linking system to provide a perfluoroelastomer material with an exceptional sealing performance at temperatures up to 310°C. The fully organic structure of the material helps to eliminate particles and reduce the cost of ownership.
Perlast® Helios GAM6 features:
- Excellent fluorine plasma resistance
- Excellent chemical resistance
- Superior high temperature performance
- Good mechanical properties
- Low out-gassing properties making it ideal for vacuum applications
- Very low trace metal content
- Very low particle generation
Your Key Account Manager
If you would like to find out more about Perlast Helios GAM6, please get in touch with your Key Account Manager, Fiona Aguiar at:
Tel: +1 408 441 2043
Mobile: +1 408 565 5610
Email: [email protected]
Request free samples
Free samples of Perlast® Helios GAM6 are available for testing in your etch and deposition equipment.
Benchmark testing was carried out by a third party test house. Further details on the testing an be obtained from PPE.