LAM Research Approved Materials from PPE

The table below shows the material grades that are currently approved for use by LAM Research.
Material datasheets can be downloaded by clicking on the PDF link in the last column.

CompoundMaterial
Type
ColorOperating
Temperature
Process TypeAttributesDatasheet
Perlast® G67PFFKMTranslucent-15 to 275°CPECVD/HDPVD
Wet Etch/Clean
Photolithography
Resist Strip
  • Fully organic
  • Exceptional purity (>1K ppb trace metal content)
  • Low particle generation
  • Extremely low out-gassing
PDF
Perlast® G74PFFKMTranslucent-15 to 275°CDeposition
Etch
  • Fully organic
  • Exceptional purity
PDF
Perlast® G100XTFFKMClear
Translucent
-20 to 275°CE-UV
  • Fully organic
  • Ultra-low out-gassing
PDF
Perlast® Helios G7HAFFKMBrown-15 to 310°C All
  • Fully organic
  • Outstanding high temperature capability
  • Excellent plasma resistance
  • Low out-gassing
  • Low trace metal content
 
Perlast® G65HPFFKMLight Brown-15 to 275°CPECVD/HDPCVD
Resist-Strip/Ash
Dielectric Etch
Condictor Etch
NF3 Remote Clean
  • Fully organic
  • Exceptional resistance to radical flourine
  • Excellent plasma resistance
  • Very low particle generation
PDF
Perlast® G67GFFKMGrey-15 to 300°CPECVD/HDPCVD
Resist Strip/Ash
Dielectric Etch
Conductor Etch
NF3 Remote clean
UV cure
  • Exceptional oxygen & flourine plasma resistance
  • Low particle generation
 PDF
Perlast® G75HFFKMWhite-15 to 320°CMetal CVD
ALD
PVD
LPCVD
SACVD
Oxidation diffusion
RTP/Thermal Oxidation
  • High temperature stability
  • Wide chemical resistance
  • Outstanding physical properties
  • Ideal for dynamic applications
 PDF
Perlast® G70HFFKMWhite-15 to 310°CPVD
  • Very good plasma resistance
  • Very good abrasion resistance
PDF 
Perlast® G71HFFKMWhite-15 to 310°CDynamic applications
  • PTFE blended grade
 
Perlast® G80AFFKMBlack-15 to 260°CWet Etch/Clean
Photolithography/Resist Strip
  • General purpose perfluoroelastomer
 PDF
Perlast® G75BFFKMBlack-15 to 325°CMetal CVD
ALD
PVD
LPCVD
SACVD
Oxidation diffusion
RTP/Thermal oxidation
  • Excellent high temperature stability
  • Exceptional acid & amine resistance
PDF
Perlast® G70CRFFKM     
Nanofluor® Y75NHPEAmber/
Translucent
-20 to 225°CPhotolithography/Resist strip
E-UV
  • Exceptional purity (>10K ppb trace metal content)
  • Very low permeability
  • Very low out-gassing
PDF
Nanofluor® Y75GHPEGrey-20 to 260°CResist Strip/Ash
Dielectric Etch
Conductor Etch
  • Exceptional oxygen & chlorine plasma resistance
  • Very low trace metal content
  • Low particle generation
PDF
Nanofluor® Y60LTHPE     
Kimura® K2CD HPE Red-15 to 300°CMetal CVD
ALD
PVD
LPCVD
SACVD
Oxidation diffusion
  • Fully organic
  • Good resistance to fluorine radicals
PDF
Kimura® K13XHPE Brown/
Amber 
-15 to 280°C Dielectric etch
  • Fully organic
  • Excellent abrasion resistance
  • Ideal for dynamic applications
  • Very low permeability
PDF
V60BFKM Black-20 to 200°C 
  •  Copolymer
 
V75SC FKM Cream-15 to 250°C Copper plating (ECD)
  • Very low permeability
  • Cost effective high performance elastomer
PDF
V75BFKM Black-20 to 200°C 
  •  Copolymer
 
V75GFKM    PDF
V75MFKM Brown-20 to 200°C 
  •  Copolymer
 
S40HVMQ Black-60 to 250°C 
  • Excellent heat resistance
  • Low temperature flexibility
 

 

Join our mailing list to receive the quarterly PPE enewsletter and be the first to know about all the latest news
Thanks for joining our enewsletter mailing list.

Join our mailing list to receive the quarterly PPE newsletter and be the first to know about all the latest news

  • New products and materials
  • Industry expert advice
  • Case studies
  • Upcoming shows and events

Enter your email and keep in the loop

Thanks for joining our enewsletter mailing list.