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LAM Research Approved Materials from PPE

The table below shows the material grades that are currently approved for use by LAM Research.
Material datasheets can be downloaded by clicking on the PDF link in the last column.

CompoundMaterial
Type
ColorOperating
Temperature
Process TypeAttributesDatasheet
Perlast® G67PFFKMTranslucent-15 to 275°CPECVD/HDPVD
Wet Etch/Clean
Photolithography
Resist Strip
  • Fully organic
  • Exceptional purity (>1K ppb trace metal content)
  • Low particle generation
  • Extremely low out-gassing
Download
Perlast® G74PFFKMTranslucent-15 to 275°CDeposition
Etch
  • Fully organic
  • Exceptional purity
Download
Perlast® G100XTFFKMClear
Translucent
-20 to 275°CE-UV
  • Fully organic
  • Ultra-low out-gassing
Download
Perlast® Helios G7HAFFKMBrown-15 to 310°C All
  • Fully organic
  • Outstanding high temperature capability
  • Excellent plasma resistance
  • Low out-gassing
  • Low trace metal content
Download
Perlast® G65HPFFKMLight Brown-15 to 275°CPECVD/HDPCVD
Resist-Strip/Ash
Dielectric Etch
Condictor Etch
NF3 Remote Clean
  • Fully organic
  • Exceptional resistance to radical flourine
  • Excellent plasma resistance
  • Very low particle generation
Download
Perlast® G67GFFKMGrey-15 to 300°CPECVD/HDPCVD
Resist Strip/Ash
Dielectric Etch
Conductor Etch
NF3 Remote clean
UV cure
  • Exceptional oxygen & flourine plasma resistance
  • Low particle generation
 Download
Perlast® G75HFFKMWhite-15 to 320°CMetal CVD
ALD
PVD
LPCVD
SACVD
Oxidation diffusion
RTP/Thermal Oxidation
  • High temperature stability
  • Wide chemical resistance
  • Outstanding physical properties
  • Ideal for dynamic applications
 Download
Perlast® G70HFFKMWhite-15 to 310°CPVD
  • Very good plasma resistance
  • Very good abrasion resistance
Download
Perlast® G71HFFKMWhite-15 to 310°CDynamic applications
  • PTFE blended grade
Coming soon
Perlast® G80AFFKMBlack-15 to 260°CWet Etch/Clean
Photolithography/Resist Strip
  • General purpose perfluoroelastomer
Download
Perlast® G75BFFKMBlack-15 to 325°CMetal CVD
ALD
PVD
LPCVD
SACVD
Oxidation diffusion
RTP/Thermal oxidation
  • Excellent high temperature stability
  • Exceptional acid & amine resistance
Download
Nanofluor® Y75NHPEAmber/
Translucent
-20 to 225°CPhotolithography/Resist strip
E-UV
  • Exceptional purity (>10K ppb trace metal content)
  • Very low permeability
  • Very low out-gassing
Download
Nanofluor® Y75GHPEGrey-20 to 260°CResist Strip/Ash
Dielectric Etch
Conductor Etch
  • Exceptional oxygen & chlorine plasma resistance
  • Very low trace metal content
  • Low particle generation
Download
Kimura® K2CD HPE Red-15 to 300°CMetal CVD
ALD
PVD
LPCVD
SACVD
Oxidation diffusion
  • Fully organic
  • Good resistance to fluorine radicals
Download
Kimura® K13XHPE Brown/
Amber 
-15 to 280°C Dielectric etch
  • Fully organic
  • Excellent abrasion resistance
  • Ideal for dynamic applications
  • Very low permeability
Download
V60BFKM Black-20 to 200°C 
  •  Copolymer
Coming soon
V75SC FKM Cream-15 to 250°C Copper plating (ECD)
  • Very low permeability
  • Cost effective high performance elastomer
Download
V75BFKM Black-20 to 200°C 
  •  Copolymer
Coming soon
V75GFKM    Download
V75MFKM Brown-20 to 200°C 
  •  Copolymer
 Coming soon
S40HVMQ White-60 to 250°C 
  • Excellent heat resistance
  • Low temperature flexibility
Coming soon

 

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